The Cryogenic Wafer Prober enables testing of cryogenic quantum devices, electronics, and detectors at temperatures below 2 K measured from the surface of the wafer. It also provides fast sample characterization, with a throughput up to 100 times faster than commonly used cryogenic chambers, and enables volume probing for up to 300 mm wafers. The system can be operated fully automatically.
The Cryogenic Wafer Prober was developed together with AEM, who have long experience in building automated wafer-level test systems.
Product Highlights
1.0
Cryogenic Wafer Prober
High Throughput Characterization System
Services
Total System Care
Total System Care enables you to focus on your own work – doing research and measurements. The service ensures that systems operate at the best possible performance level and with maximal uptime, without users needing to spend time maintaining the systems themselves.
Technical Specifications
2.0
Cryogenic Wafer Prober
High Throughput Characterization System
Options
3.0
Cryogenic Wafer Prober
High Throughput Characterization System
Performance Graphs
4.0
Cryogenic Wafer Prober
High Throughput Characterization System
Services
Customer Care
We support our customers throughout the lifetime of their system, providing dedicated care to find solutions for any issues. Our technicians and engineers are ready to help you wherever you are located, with prompt service delivered either remotely or on-site.
Layout and Facility Requirements
5.0
Cryogenic Wafer Prober
High Throughput Characterization System